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July 5, 2009

Strasbaugh to introduce new CMP system

New system to combine the production and process flexibility of CMP machines with the technologies available

By CBR Staff Writer

Strasbaugh, a designer and manufacturer of precision surfacing products, has said that it will introduced its new STB P300 CMP system at Semicon West in San Francisco, July 14-17, 2009.

Strasbaugh said that P300 combines the production and process flexibility of CMP machines with the CMP technologies available. The company claims that, with the process performance, integrated wafer cleaning, and low cost of ownership, the new system offers device makers a new option in CMP.

The company also said that several new CMP technologies will be introduced with the P300, including its new nVision II optical and motor current endpoint detection system, the new generation Saturn wafer carrier and the Precision pad conditioner.

Chuck Schillings, president and CEO of Strasbaugh, said: The P300 is the first CMP machine in the industry designed to meet the demand for leaner, more agile, manufacturing. It provides improved process performance in a high production system that has the flexibility to support high mix, small lot applications – all at a competitive capital cost.”

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