Fujitsu Semiconductor Europe and the Fraunhofer Institute for Integrated Circuits (IIS) are working jointly to develop future-proof nanometre chips for their customers.
Since the beginning of 2010, both parties jointly started new research and development projects, which are aimed at multimedia, image processing and navigation applications in the automotive, industrial and telecommunications markets.
The R&D projects are using Fujitsu’s analogue and digital nanometre technology libraries, and intellectual property (IP) pool of both parties as well as IC and system design experience of Fraunhofer IIS.
Prototypes in 90 nm and 65 nm CMOS technologies on multi-project wafers (MPW) at reduced mask costs are being produced by Fujitsu.
Fujitsu and Fraunhofer’s technology partners can implement fast and highly efficient offerings.
Fraunhofer IIS head of IC Design Josef Sauerer said this co-operation grants cost-effective and dependable access to the latest nanometre technology for research projects, pilot series and products.
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